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LIQUID JUNCTIONS FOR CHARACTERIZATION OF ELECTRONIC MATERIALS .4. IMPEDANCE SPECTROSCOPY OF REACTIVE ION-ETCHED SI
被引:7
|
作者
:
FANTINI, MCA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,HOPEWELL JUNCTION,NY 12533
IBM CORP,HOPEWELL JUNCTION,NY 12533
FANTINI, MCA
[
1
]
SHEN, WM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,HOPEWELL JUNCTION,NY 12533
IBM CORP,HOPEWELL JUNCTION,NY 12533
SHEN, WM
[
1
]
TOMKIEWICZ, M
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,HOPEWELL JUNCTION,NY 12533
IBM CORP,HOPEWELL JUNCTION,NY 12533
TOMKIEWICZ, M
[
1
]
GAMBINO, JP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,HOPEWELL JUNCTION,NY 12533
IBM CORP,HOPEWELL JUNCTION,NY 12533
GAMBINO, JP
[
1
]
机构
:
[1]
IBM CORP,HOPEWELL JUNCTION,NY 12533
来源
:
JOURNAL OF APPLIED PHYSICS
|
1989年
/ 66卷
/ 05期
关键词
:
D O I
:
10.1063/1.344310
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:2148 / 2155
页数:8
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