INFLUENCE OF OXYGEN ON RADIATION-STIMULATED DIFFUSION OF PHOSPHORUS IN SILICON

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作者：
BORISENKO, VE
BUIKO, LD
LABUNOV, VA
UKHOV, VA
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SOVIET PHYSICS SEMICONDUCTORS-USSR | 1981年 / 15卷 / 01期
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O469 [凝聚态物理学];
学科分类号：
070205 ;
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页码：1 / 3
页数：3
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