INFLUENCE OF RADIATION-STIMULATED DIFFUSION ON THE SPUTTERING OF SILICON BY LOW-ENERGY IONS

被引：0

作者：

LABUNOV, VA

BORISENKO, VE

机构：

来源：

SOVIET PHYSICS SEMICONDUCTORS-USSR | 1981年 / 15卷 / 07期

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中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

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引用

页码：816 / 817

页数：2

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