DIFFUSION-COEFFICIENT OF COBALT IN SILICON

被引：19

|

作者：

KITAGAWA, H ^{[1
]}

HASHIMOTO, K ^{[1
]}

机构：

[1] KYUSHU UNIV,FAC ENGN,DEPT ELECT ENGN,FUKUOKA 812,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1977年 / 16卷 / 01期

关键词：

D O I：

10.1143/JJAP.16.173

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：173 / 174

页数：2

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