POLYMERIZATION IN CHF3 OXIDE ETCH DISCHARGES

被引：0
|
作者：
BARIYA, AJ [1 ]
MCVITTIE, JP [1 ]
DELARIOS, JM [1 ]
FRANK, CW [1 ]
机构：
[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C126 / C126
页数：1
相关论文
共 50 条
  • [1] Ion and neutral species in C2F6 and CHF3 dielectric etch discharges
    Jayaraman, R
    McGrath, RT
    Hebner, GA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1999, 17 (04): : 1545 - 1551
  • [2] THE ETCHING OF CHF3 PLASMA POLYMER IN FLUORINE-CONTAINING DISCHARGES
    BARIYA, AJ
    SHAN, HQ
    FRANK, CW
    SELF, SA
    MCVITTIE, JP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (01): : 1 - 7
  • [3] Fluoroform (CHF3)
    Kyasa, ShivaKumar
    SYNLETT, 2015, 26 (13) : 1911 - 1912
  • [4] SI/SIO2 ETCH PROPERTIES USING CF4 AND CHF3 IN RADIO-FREQUENCY CYLINDRICAL MAGNETRON DISCHARGES
    YEOM, GY
    KUSHNER, MJ
    APPLIED PHYSICS LETTERS, 1990, 56 (09) : 857 - 859
  • [5] Electron collision cross sections of CHF3 and electron transport in CHF3 and CHF3-Ar mixtures
    Kawaguchi, Satoru
    Satoh, Kohki
    Itoh, Hidenori
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (01)
  • [6] Modeling etch rate and uniformity of oxide via etching in a CHF3/CF4 plasma using neural networks
    Kim, B
    Kwon, KH
    Kwon, SK
    Park, JM
    Yoo, SW
    Park, KS
    You, IK
    Kim, BW
    THIN SOLID FILMS, 2003, 426 (1-2) : 8 - 15
  • [7] A study on the pyrolysis of CHF3
    Zhang, Pin
    Cao, Liying
    Pan, Renming
    Jiang, Zefan
    Qin, Kuang
    Li, Quanwei
    9TH ASIA-OCEANIA SYMPOSIUM ON FIRE SCIENCE AND TECHNOLOGY, 2013, 62 : 337 - 341
  • [8] Electron interactions with CHF3
    Christophorou, L.G.
    Olthoff, J.K.
    Rao, M.V.V.S.
    Journal of Physical and Chemical Reference Data, 26 (01): : 1 - 15
  • [9] Electron interactions with CHF3
    Christophorou, LG
    Olthoff, JK
    Rao, MVVS
    JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1997, 26 (01) : 1 - 15
  • [10] Critical properties of CO2, CHF3, SF6, (CO2 + CHF3), and (CHF3 + SF6)
    Inst. Tech. Thermodyn. Kaltetechnik, Universität Karlsruhe , Richard-Willstätter-Allee 2, D-76128 Karlsruhe, Germany
    J Chem Thermodyn, 4 (481-496):
12345