Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different sputtering power

被引：10

作者：

Myroniuk, D. V. ^{[1
]}

Ievtushenko, A. I. ^{[1
]}

Lashkarev, G. V. ^{[1
]}

Maslyuk, V. T. ^{[2
]}

Timofeeva, I. I. ^{[1
]}

Baturin, V. A. ^{[3
]}

Karpenko, O. Yu. ^{[3
]}

Kuznetsov, V. M. ^{[3
]}

Dranchuk, M. V. ^{[1
]}

机构：

[1] NAS Ukraine, Frantsevich Inst Problems Mat Sci, 3 Krzhizhanovsky Str, UA-03680 Kiev, Ukraine

[2] NAS Ukraine, Inst Electron Phys, UA-88017 Uzhgorod, Ukraine

[3] NAS Ukraine, Inst Appl Phys, UA-40000 Sumy, Ukraine

来源：

SEMICONDUCTOR PHYSICS QUANTUM ELECTRONICS & OPTOELECTRONICS | 2015年 / 18卷 / 03期

关键词：

transparent conductive aluminium doped zinc oxide; AZO; electron irradiation; point defects; X-ray diffraction; stress; resistance;

D O I：

10.15407/spqeo18.03.286

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Transparent conductive oxide thin films of Al-doped ZnO grown by if magnetron sputtering were irradiated with high energy electrons with the energy 12.6 MeV and fluence 5.10(14) e/cm(2). The films were produced using different sputtering powers. It has been shown that electron irradiation creates defects that lead to distortions of the crystal lattice, which results in reduced crystallinity of the films. Also, it leads to film heating that results in radiation annealing and relaxation of the lattice.

引用

页码：286 / 291

页数：6

共 50 条

[21] Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process
Zhao, Kai
Xie, Jingye
Zhao, Yudi
Han, Dedong
Wang, Yi
Liu, Bin
Dong, Junchen
NANOMATERIALS, 2022, 12 (01)
[22] The effect of annealing on Al-doped ZnO films deposited by RF magnetron sputtering method for transparent electrodes
Cho, Hyung Jun
Lee, Sung Uk
Hong, Byungyou
Shin, Yong Deok
Ju, Jin Young
Kim, Hee Dong
Park, Mungi
Choi, Won Seok
THIN SOLID FILMS, 2010, 518 (11) : 2941 - 2944
[23] Transparent and conductive ZnO:Al prepared by RF diode sputtering
Shtereva, K.
Flickyngerova, S.
Sutta, P.
Netrvalova, M.
Novotny, I.
Tvarozek, V.
PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 2008, 100
[24] TRANSPARENT AND HIGHLY CONDUCTIVE FILMS OF ZNO PREPARED BY RF SPUTTERING
ITO, K
NAKAZAWA, T
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04): : L245 - L247
[25] High transparent and conductive undoped ZnO thin films deposited by reactive ion-beam sputtering
Golovynskyi, Sergii
Ievtushenko, Arsenii
Mamykin, Sergii
Dusheiko, Mykhailo
Golovynska, Iuliia
Bykov, Oleksandr
Olifan, Olena
Myroniuk, Denys
Tkach, Sergii
Qu, Junle
VACUUM, 2018, 153 : 204 - 210
[26] Effects of sputtering power on Al doped ZnO thin films deposited by RF magnetron sputtering
Gao, Li-Hua
Zheng, Yu-Ying
Gongneng Cailiao/Journal of Functional Materials, 2015, 46 (08): : 08028 - 08030
[27] Textured transparent conductive B/Al doped ZnO films utilizing reactive magnetron sputtering
Liu, Yang
Huang, Qian
Bai, Lisha
Wei, Changchun
Zhang, Dekun
Zhang, Xiaodan
RSC ADVANCES, 2015, 5 (113) : 92829 - 92835
[28] Study on transparent conducting ZnO:Al films deposited on organic substrate by RF magnetron sputtering
Yang, Tianlin
Zhang, Deheng
Li, Ziran
Ma, Honglei
Ma, Jin
Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 1999, 20 (02): : 200 - 203
[29] Fabrication and Characterization of Transparent Conductive ZnO:Al Thin Films Deposited on Polyethylene Terephthalate Substrates
Yang, Wei-Jen
Tsao, Chung-Chen
Hsu, Chun-Yoa
Chang, Hung-Chih
Chou, Chang-Ping
Kao, Jin-Yih
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2012, 95 (07) : 2140 - 2147
[30] Development of ALD ZnO:Al as transparent conductive films
Napoleonov, B.
Marinova, V
Petrova, D.
Blagoev, B.
Avramova, I
Dimitrov, D.
21ST INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES, 2020, 1492

← 1 2 3 4 5 →