ANNEALING OF PHOSPHORUS IMPLANTED SILICON-WAFERS BY MULTISCANNING ELECTRON-BEAM - SOLAR-CELLS APPLICATION

被引：9
|
作者：
BENTINI, GG
GALLONI, R
GABILLI, E
NIPOTI, R
OLZI, E
SERVIDORI, M
TURISINI, G
ZIGNANI, F
机构：
[1] C.N.R. Istituto LAMEL, via Castagnoli 1, 40126 Bologna, Italy
来源：
JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 11期
关键词：
All Open Access; Bronze;
D O I：
10.1063/1.328625
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
27
引用
收藏
页码：6735 / 6742
页数：8
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