SULFUR DOPING BEHAVIOR OF GALLIUM ANTIMONIDE GROWN BY MOLECULAR-BEAM EPITAXY

被引:19
|
作者
POOLE, I
LEE, ME
SINGER, KE
FROST, JEF
KERR, TM
WOOD, CEC
ANDREWS, DA
ROTHWELL, WJM
DAVIES, GJ
机构
[1] UNIV MANCHESTER,INST SCI & TECHNOL,CTR ELECTR MAT,MANCHESTER M60 1QD,LANCS,ENGLAND
[2] GE RES LTD,HIRST RES CTR,WEMBLEY HA9 7PP,MIDDX,ENGLAND
[3] BRITISH TELECOM RES LABS,IPSWICH IP5 7RE,SUFFOLK,ENGLAND
关键词
D O I
10.1063/1.340251
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:395 / 399
页数:5
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