GIANT PHOTOEXPANSION IN AS2S3 GLASS

被引：196
|
作者：
HISAKUNI, H
TANAKA, K
机构：
[1] Department of Applied Physics, Faculty of Engineering, Hokkaido University
来源：
APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 23期
关键词：
D O I：
10.1063/1.112533
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
When illuminated with a focused beam from He-Ne lasers, As 2S3 films with thickness of ∼50 μm exhibit the thickness expansion reaching to 3 μm, which is approximately 10 times as great as that expected from the conventional photoexpansion phenomenon. The enhancement seems to be caused by photorelaxation of strain generated by photoexpansion. © 1994 American Institute of Physics.
引用
收藏
页码：2925 / 2927
页数：3
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