DETERMINATION OF COMPOSITION, THICKNESS AND GROWTH-RATE PROFILES OF MOCVD GROWN HG1-XCDXTE

被引:3
|
作者
RUSSO, SP
PAIN, GN
JOHNSTON, PN
ELLIMAN, RG
机构
[1] EPI CRYSTAL SUPPLIES PTY LTD,MONBULK 3793,AUSTRALIA
[2] AUSTRALIAN NATL UNIV,RES SCH PHYS SCI & ENGN,DEPT ELECTR MAT ENGN,CANBERRA,ACT 2601,AUSTRALIA
关键词
D O I
10.1016/0022-0248(93)90404-K
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Rutherford backscattering spectrometry (RBS) and particle induced X-ray emission (PIXE) measurements have been performed on epitaxial Hg1-xCdxTe (MCT) layers on sapphire to determine composition, thickness and growth rates at discrete points along, and perpendicular to, the direction of gas flow in the MOCVD reactor cell. Continuous profiles of each property, over an area of 40 X 90 mm, have then been calculated by polynomial fitting and scaling of these discrete points. These profiles were used to compare MOCVD growth of MCT onto substrates placed on and below the cracking susceptor in the reactor cell.
引用
收藏
页码:124 / 132
页数:9
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