SOME PROPERTIES OF SIO2 FILMS DEPOSITED BY REACTION OF SIH4 WITH WATER VAPOR

被引：19
|
作者：
HANETA, Y
NAKANUMA, S
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1967年 / 6卷 / 10期
关键词：
D O I：
10.1143/JJAP.6.1176
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1176 / +
页数：1
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