LOW-LEVEL RADIATION RISK

被引：0

|

作者：

LURIE, AG

VALACHOVIC, RW

机构：

来源：

JOURNAL OF THE AMERICAN DENTAL ASSOCIATION | 1980年 / 100卷 / 05期

关键词：

D O I：

10.14219/jada.archive.1980.0218

中图分类号：

R78 [口腔科学];

学科分类号：

1003 ;

摘要：

引用

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页码：658 / 658

页数：1

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