MINIMAL BEAM EXPOSURE WITH A FIELD-EMISSION SOURCE

被引：8
|
作者：
OHTSUKI, M [1 ]
ZEITLER, E [1 ]
机构：
[1] UNIV CHICAGO,CHICAGO,IL 60637
来源：
ULTRAMICROSCOPY | 1975年 / 1卷 / 02期
关键词：
D O I：
10.1016/S0304-3991(75)80021-0
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
引用
收藏
页码：163 / 165
页数：3
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