A Field-emission X-ray Source using an Anisotropically Focused Electron Beam

被引：0

作者：

Jung, Sunshin ^{[1
]}

Han, Woo Kyung ^{[1
]}

Kim, Daeho ^{[1
]}

Chang, Won Suk ^{[1
]}

Seol, Seung Kwon ^{[1
]}

Bae, Woo Mi ^{[2
]}

Byun, Gui Sob ^{[3
]}

Park, Kyu Chang ^{[2
]}

Ju, Byeong Kwon ^{[3
]}

机构：

[1] Korea Electrotechnol Res Inst, Ansan 426170, South Korea

[2] Kyung Hee Univ, Seoul 130701, South Korea

[3] Korea Univ, Seoul 136701, South Korea

来源：

NANOTECHNOLOGY 2011: ADVANCED MATERIALS, CNTS, PARTICLES, FILMS AND COMPOSITES, NSTI-NANOTECH 2011, VOL 1 | 2011年

关键词：

field emission; X-ray source; electron beam;

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A field-emission x-ray source for dental imaging with an anode voltage of 70 kV and an anode current of more than 1 mA was designed and assembled using an anisotropically focused electron beam. With up to 3 kV (5 V/um) applied to a grid, the emitted electrons from a carbon nanotube based cathode were shaped into an elliptical beam by an anisotropic electron lens. The electron beam was accelerated by an 13.5-degree angled stationary anode target and focused to a small spot size, which results in an circular-shaped effective x-ray focal spot with a diameter of less than 400 um.

引用

页码：185 / 187

页数：3

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