POLYSILANES - RADIATION SENSITIVE MATERIALS FOR MICROLITHOGRAPHY

被引：0
|
作者：
MILLER, RD [1 ]
机构：
[1] IBM CORP,DIV RES,ALMADEN RES CTR,SAN JOSE,CA 95120
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1990年 / 200卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：119 / POLY
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