THIN-FILM GROWTH OF AG ON KCL STUDIED BY LEED-AES EXPERIMENTS

被引:0
|
作者
TOKUTAKA, H [1 ]
NISHIMORI, K [1 ]
ISHIHARA, N [1 ]
TAKASHIMA, K [1 ]
机构
[1] TOTTORI UNIV,FAC ENGN,DEPT ELECTR,KOYAMA,TOTTORI 680,JAPAN
关键词
D O I
10.1143/JJAP.16.527
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:527 / 528
页数:2
相关论文
共 50 条
  • [31] MODELS OF THIN-FILM GROWTH
    HRACH, R
    HRACHOVA, V
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1992, 73 (05) : 981 - 982
  • [32] SIMULATION OF THIN-FILM GROWTH
    HRACH, R
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1990, 69 (01) : 55 - 64
  • [33] THE SIMULATION OF THIN-FILM GROWTH
    HRACH, R
    STARY, V
    THIN SOLID FILMS, 1981, 85 (3-4) : 285 - 292
  • [34] FUNDAMENTALS OF THIN-FILM GROWTH
    STRINGFELLOW, GB
    JOURNAL OF CRYSTAL GROWTH, 1994, 137 (1-2) : 212 - 223
  • [35] SIMULATION OF THIN-FILM GROWTH
    XIA, MH
    LIU, X
    GU, PF
    APPLIED OPTICS, 1993, 32 (28): : 5443 - 5446
  • [36] (210) TWIN IN (001) AG THIN-FILM
    HOSHI, I
    OGURA, I
    JOURNAL OF ELECTRON MICROSCOPY, 1987, 36 (05): : 332 - 332
  • [37] A NEW FURNACE FOR THIN-FILM STRESS EXPERIMENTS
    VONPREISSIG, FJ
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1992, 63 (04): : 2305 - 2310
  • [38] GROWTH-KINETICS OF SILICON THIN-FILM STUDIED BY HYDROGEN RADICAL AND ION IRRADIATION
    MIYAZAKI, S
    INOUE, Y
    KIRIKI, Y
    HIROSE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (11): : 2382 - 2386
  • [39] VAPOR-DEPOSITION OF LEAD ON AG(111) AND EQUILIBRIUM SURFACE SEGREGATION FROM AG-PB(111) SOLID-SOLUTIONS - A LEED-AES COMPARATIVE-STUDY
    ROLLAND, A
    BERNARDINI, J
    BARTHESLABROUSSE, MG
    SURFACE SCIENCE, 1984, 143 (2-3) : 579 - 590
  • [40] EPITAXIAL-GROWTH AND MOLECULAR-ORIENTATION OF TETRAPHENYLPORPHYRIN THIN-FILM VACUUM-EVAPORATED ON KCL
    ASHIDA, M
    YANAGI, H
    HAYASHI, S
    TAKEMOTO, K
    ACTA CRYSTALLOGRAPHICA SECTION B-STRUCTURAL SCIENCE, 1991, 47 : 87 - 91