STUDY OF ULTRA-THIN GE/SI STRAINED LAYER SUPERLATTICE

被引：5
|
作者：
CHANG, SJ [1 ]
HUANG, CF [1 ]
KALLEL, MA [1 ]
WANG, KL [1 ]
BOWMAN, RC [1 ]
ADAMS, PM [1 ]
机构：
[1] AEROSPACE CORP,LOS ANGELES,CA 90009
来源：
JOURNAL OF CRYSTAL GROWTH | 1989年 / 95卷 / 1-4期
关键词：
D O I：
10.1016/0022-0248(89)90440-5
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
引用
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页码：451 / 454
页数：4
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