ION-BEAM LITHOGRAPHY SYSTEM USING A HIGH BRIGHTNESS H2+ ION-SOURCE

被引：0

作者：

SIEGEL, BM

HANSON, GR

SZILAGYI, M

THOMAS, DR

BLACKWELL, RJ

PAIK, H

机构：

来源：

PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 1982年 / 333卷

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D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：152 / 157

页数：6

共 50 条

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