MATERIAL PARAMETERS IN THICK HYDROGENATED AMORPHOUS-SILICON RADIATION DETECTORS

被引：1

|

作者：

QUERESHI, S ^{[1
]}

PEREZMENDEZ, V ^{[1
]}

KAPLAN, SN ^{[1
]}

FUJIEDA, I ^{[1
]}

CHO, G ^{[1
]}

STREET, RA ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1989年 / 114卷

关键词：

D O I：

10.1016/0022-3093(89)90603-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：417 / 419

页数：3

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