THE EFFECT OF TARGET SUBSTRATE COUPLING ON REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING

被引：11
|
作者：
SCHILLER, S
HEISIG, U
KORNDORFER, C
STRUMPFEL, J
FRACH, P
机构：
来源：
SURFACE & COATINGS TECHNOLOGY | 1989年 / 39卷 / 1-3期
关键词：
D O I：
10.1016/S0257-8972(89)80016-7
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：549 / 564
页数：16
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