CHARACTERIZATION OF PLASMA-DEPOSITED ORGANO-SILICON THIN-FILMS

被引：19
|
作者：
SACHDEV, KG
SACHDEV, HS
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
[2] IBM CORP,POUGHKEEPSIE,NY 12602
来源：
THIN SOLID FILMS | 1983年 / 107卷 / 03期
关键词：
D O I：
10.1016/0040-6090(83)90403-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：245 / 250
页数：6
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