STRUCTURE OF THIN LEAD OXIDE LAYERS AS DETERMINED BY X-RAY-DIFFRACTION

被引：33

作者：

LIGHT, TB ^{[1
]}

ELDRIDGE, JM ^{[1
]}

MATTHEWS, JW ^{[1
]}

GREINER, JH ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 04期

关键词：

D O I：

10.1063/1.321799

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1489 / 1492

页数：4

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