A STUDY OF THE TI/AL2O3 THIN-FILM COMPOSITE

被引:0
|
作者
PEDDADA, RS
BIRNBAUM, HK
ROBERTSON, IM
机构
[1] UNIV ILLINOIS,DEPT MAT SCI & ENGN,URBANA,IL 61801
[2] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
来源
JOURNAL OF METALS | 1988年 / 40卷 / 11期
关键词
D O I
暂无
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
收藏
页码:80 / 80
页数:1
相关论文
共 50 条
  • [31] Thin-film reactions during diffusion soldering of Cu/Ti/Si and Au/Cu/Al2O3 with Sn interlayers
    Liang, MW
    Hsieh, TE
    Chang, SY
    Chuang, TH
    JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (09) : 952 - 956
  • [32] Thin-film reactions during diffusion soldering of Cu/Ti/Si and Au/Cu/Al2O3 with Sn interlayers
    M. W. Liang
    T. E. Hsieh
    S. Y. Chang
    T. H. Chuang
    Journal of Electronic Materials, 2003, 32 : 952 - 956
  • [33] Thin film growth related adsorption study of Al and O ions on an α-Al2O3 surface
    Rosén, J
    Schneider, JM
    Larsson, K
    JOURNAL OF PHYSICAL CHEMISTRY B, 2004, 108 (50): : 19320 - 19324
  • [34] Regimes of leakage current in ALD-processed Al2O3 thin-film layers
    Spahr, Holger
    Reinker, Johannes
    Buelow, Tim
    Nanova, Diana
    Johannes, Hans-Hermann
    Kowalsky, Wolfgang
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2013, 46 (15)
  • [35] Characterization of a pentacene thin-film transistor with a HfO2/Al2O3 gate insulator
    Kim, HJ
    Kang, SJ
    Park, DS
    Chung, KB
    Noh, M
    Whang, CN
    Cho, MH
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2004, 45 (04) : 935 - 938
  • [36] Study of preparation technique for (Ni, Cr)/Al2O3 composite film
    Nanchang Univ, Nanchang, China
    Cailiao Gongcheng, 8 (28-30):
  • [37] Optimization of Al2O3/ZrO2 nanolaminate structure for thin-film encapsulation of OLEDs
    Seo, Seung-Woo
    Jung, Eun
    Chae, Heeyeop
    Cho, Sung Min
    ORGANIC ELECTRONICS, 2012, 13 (11) : 2436 - 2441
  • [38] Atomic-Layer-Deposited Alumina (Al2O3) Coating on Thin-Film Cryoresistors
    Hahtela, Ossi M.
    Satrapinski, Alexandre F.
    Sievila, Paivi H.
    Chekurov, Nikolai
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2009, 58 (04) : 1183 - 1187
  • [39] ION-IRRADIATION INDUCED PHASE-TRANSFORMATION IN AL2O3 THIN-FILM
    MATSUMURA, N
    HAYASHI, T
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1992, 56 (01) : 1 - 6
  • [40] Growth of Thin Film Water on α-Al2O3 (0001): An FTIR Study
    Thomas, Alyssa C.
    Richardson, Hugh H.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2008, 112 (50): : 20033 - 20037