SILICIDE FORMATION AND INTERDIFFUSION EFFECTS IN SI-TA, SIO2-TA AND SI-PTSI-TA THIN-FILM STRUCTURES

被引：35
|
作者：
CHRISTOU, A [1 ]
DAY, HM [1 ]
机构：
[1] USN,RES LAB,WASHINGTON,DC 20375
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1976年 / 5卷 / 01期
关键词：
D O I：
10.1007/BF02652882
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：1 / 12
页数：12
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