VAPOR GROWTH OF GERMANIUM-SILICON ALLOY FILMS ON GERMANIUM SUBSTRATES

被引：9
|
作者：
NEWMAN, RC
WAKEFIELD, J
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1963年 / 110卷 / 10期
关键词：
D O I：
10.1149/1.2425585
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1068 / 1071
页数：4
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