VAPOR GROWTH OF GERMANIUM-SILICON ALLOY FILMS ON GERMANIUM SUBSTRATES

被引：9

|

作者：

NEWMAN, RC

WAKEFIELD, J

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1963年 / 110卷 / 10期

关键词：

D O I：

10.1149/1.2425585

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：1068 / 1071

页数：4

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