THE GROWTH OF AMORPHOUS AND GRAPHITIC CARBON LAYERS UNDER ION-BOMBARDMENT IN AN RF PLASMA

被引：10
|
作者：
NYAIESH, AR
HOLLAND, L
机构：
来源：
VACUUM | 1984年 / 34卷 / 05期
关键词：
D O I：
10.1016/0042-207X(84)90369-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：519 / 522
页数：4
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