OPTICALLY-EXCITED MINORITY-ELECTRON VELOCITY IN SELECTIVELY BE-DOPED ALGAAS/GAAS/ALGAAS SINGLE QUANTUM-WELLS

被引:5
|
作者
SHIGEKAWA, N
FURUTA, T
MAEZAWA, K
MIZUTANI, T
机构
[1] NTT LSI Laboratories, Atsugi-shi, Kanagawa 243-01
关键词
D O I
10.1063/1.102545
中图分类号
O59 [应用物理学];
学科分类号
摘要
The minority-electron velocity versus electric field (v-E) relationship was measured for selectively Be-doped Al0.5Ga0.5As/GaAs/ Al0.5Ga0.5As single quantum wells with different well-layer thicknesses by means of the time-of-flight (TOF) method at room temperature. It was found that the electron drift velocity for the 200-Å-thick quantum well is suppressed in comparison with those for the 600-Å-thick and 2000-Å-thick wells. This suppression is successfully explained by considering that the electron-hole interaction is enhanced in narrower wells due to a larger overlap of the wave functions of electrons and holes.
引用
收藏
页码:1146 / 1148
页数:3
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