ELECTRON-CYCLOTRON RESONANCE PLASMA-INDUCED DAMAGE IN ALGAAS/GAAS/ALGAAS SINGLE QUANTUM-WELLS

被引:14
|
作者
SWAMINATHAN, V [1 ]
ASOM, MT [1 ]
CHAKRABARTI, UK [1 ]
PEARTON, SJ [1 ]
机构
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
关键词
D O I
10.1063/1.104328
中图分类号
O59 [应用物理学];
学科分类号
摘要
Changes in cathodoluminescence (CL) intensity from a buried single AlGaAs/GaAs/AlGaAs quantum well (QW) as a result of exposure to electron cyclotron resonance (ECR) hydrogen or argon discharges are reported. For additional dc biases of 150 V on the sample during either H-2 or Ar plasma exposure, we observe substantial decreases in CL intensity from the well. Ar+ ion bombardment creates damage more resistant to annealing than does H+ ion bombardment at the same energy. The ECR discharges alone with zero additional dc bias cause degradation in the well luminescence due possibly to defects created by energetic electron bombardment or ultraviolet illumination. At intermediate bias voltages (50 V) strong hydrogen passivation of nonradiative centers is observed, leading to 500% increases in CL intensity from the well. The initial characteristics of the QW under these conditions are restored by annealing at 400-degrees-C.
引用
收藏
页码:1256 / 1258
页数:3
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