KINETICS AND MECHANISMS OF CHEMICAL-REACTIONS IN NON-EQUILIBRIUM PLASMA-ETCHING OF SILICON AND SILICON-COMPOUNDS

被引：20
|
作者：
VINOGRADOV, GK
NEVZOROV, PI
POLAK, LS
SLOVETSKY, DI
机构：
来源：
VACUUM | 1982年 / 32卷 / 09期
关键词：
D O I：
10.1016/0042-207X(82)93782-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：529 / 537
页数：9
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