ELECTRON-STATES DENSITY IN THIN COPPER-FILMS

被引：0

作者：

VOYTCHAK, L ^{[1
]}

ROMANOVSKI, S ^{[1
]}

STASYAK, V ^{[1
]}

TEMKO, SV ^{[1
]}

机构：

[1] MOSCOW GEOL EXPLORAT INST,MOSCOW,USSR

来源：

FIZIKA METALLOV I METALLOVEDENIE | 1983年 / 56卷 / 06期

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：1056 / 1064

页数：9

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