we have studied Metal-Insulator-Semiconductor (MIS) devices with fullerene as the active semiconductor. We have made impedance analysis measurements on these devices and we use these to characterise electrical transport in fullerene and the interfaces with insulators and metals. We have measured the modulation of the optical transmission through the devices with gate voltage. We see a strong field-dependent modulation of the dipole-allowed transitions. We observe also optical transitions due to charges injected into the fullerene layer when we use C60/C70 mixtures. With pure C60 we see features related to charge injection only when the devices are exposed to illumination above the band gap. The positions of these charge-induced optical features do not match those observed following chemical doping. The optical characteristics of the pure C60 and the C70/C60 MIS devices are consistent with the impedance analysis.
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Tokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, Japan
Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R ChinaTokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, Japan
Noma, Taishi
Taguchi, Dai
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Tokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, JapanTokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, Japan
Taguchi, Dai
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Manaka, Takaaki
Lin, Hong
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Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R ChinaTokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, Japan
Lin, Hong
Iwamoto, Mitsumasa
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Tokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, JapanTokyo Inst Technol, Dept Elect & Elect Engn, Meguro Ku, 2-12-1 O Okayama, Tokyo 1528552, Japan
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Univ Witwatersrand, DST Ctr Excellence Strong Mat & Mat Phys, Res Inst, Sch Phys, ZA-2050 Johannesburg, South AfricaUniv Witwatersrand, DST Ctr Excellence Strong Mat & Mat Phys, Res Inst, Sch Phys, ZA-2050 Johannesburg, South Africa
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Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
Taheri, Maedeh
Sesing, Nicholas
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Univ Georgia, Dept Chem, Athens, GA 30602 USAUniv Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
Sesing, Nicholas
Salguero, Tina T.
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Univ Georgia, Dept Chem, Athens, GA 30602 USAUniv Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
Salguero, Tina T.
Balandin, Alexander A.
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Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
Univ Calif Los Angeles, Calif NanoSyst Inst, Los Angeles, CA 90095 USAUniv Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA