SELF-INTERACTION OF SURFACE-POLARITONS AT THE NARROW-GAP N-TYPE SEMICONDUCTOR METAL INTERFACE

被引:5
|
作者
AZARENKOV, NA
OSTRIKOV, KN
OSMAYEV, OA
机构
[1] Kharkov State University, Kharkov
关键词
D O I
10.1016/0038-1098(93)90168-M
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The nonlinear self-interaction of the potential surface polaritons (SP) which is due to the free carriers dispersion law where nonparabolicity is studied. The SP propagate at the interface between n-type semiconductor and a metal. The self interaction of the SP is shown to be different in semiconductors with normal and inverse zone structures. The results of the SP field envelope evolution are given. The obtained nonlinear frequency shift has been compared with shifts which are due to another self-interaction mechanisms. This comparison shows that the nonlinear self-interaction mechanism, which is due to free carriers spectrum nonparabolicity, is especially significant in narrow-gap semiconductor materials.
引用
收藏
页码:1065 / 1069
页数:5
相关论文
共 43 条
  • [31] Control of subthreshold characteristics of narrow-channel silicon-on-insulator n-type metal-oxide-semiconductor transistor with additional side gate electrodes
    Okuyama, Kiyoshi
    Yoshikawa, Koji
    Sunami, Hideo
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4B): : 2050 - 2053
  • [32] Interface properties in metal-oxide-semiconductor structures on n-type 4H-SiC(03(3)over-bar8)
    Yano, H
    Hirao, T
    Kimoto, T
    Matsunami, H
    Shiomi, H
    APPLIED PHYSICS LETTERS, 2002, 81 (25) : 4772 - 4774
  • [33] A Superjunction Insulated Gate Bipolar Transistor with Embedded Self-biased N-Type Metal–Oxide–Semiconductor Field-Effect Transistor
    Lijuan Wu
    Banghui Zhang
    Gaoqiang Deng
    Xuanting Song
    Heng Liu
    Qing Liu
    Tao Qiu
    Journal of Electronic Materials, 2023, 52 : 2177 - 2184
  • [34] A Superjunction Insulated Gate Bipolar Transistor with Embedded Self-biased N-Type Metal-Oxide-Semiconductor Field-Effect Transistor
    Wu, Lijuan
    Zhang, Banghui
    Deng, Gaoqiang
    Song, Xuanting
    Liu, Heng
    Liu, Qing
    Qiu, Tao
    JOURNAL OF ELECTRONIC MATERIALS, 2023, 52 (03) : 2177 - 2184
  • [35] ⟨100⟩ n-type metal-oxide-semiconductor field-effect transistor-embedded microcantilever sensor for observing the kinetics of chemical molecules interaction
    Wang, Jian
    Wu, Wengang
    Huang, Ying
    Hao, Yilong
    APPLIED PHYSICS LETTERS, 2009, 95 (12)
  • [36] Reduction of interface-state density in 4H-SiC n-type metal-oxide-semiconductor structures using high-temperature hydrogen annealing
    Fukuda, K
    Suzuki, S
    Tanaka, T
    Arai, K
    APPLIED PHYSICS LETTERS, 2000, 76 (12) : 1585 - 1587
  • [37] Optimization of electrical characteristics of TiO2-incorporated HfO2 n-type doped gallium arsenide metal oxide semiconductor capacitor with silicon interface passivation layer
    Park, Sung Il
    Ok, Injo
    Kim, Hyoung-Sub
    Zhu, Feng
    Zhang, Manhong
    Yum, Jung Hwan
    Han, Zhao
    Lee, Jack C.
    APPLIED PHYSICS LETTERS, 2007, 91 (08)
  • [38] Effect of hot-carrier-induced interface states distribution on linear drain current degradation in 0.35 μm n-type lateral diffused metal-oxide-semiconductor transistors
    Lee, J. R.
    Chen, Jone F.
    Wu, Kuo-Ming
    Liu, C. M.
    Hsu, S. L.
    APPLIED PHYSICS LETTERS, 2008, 92 (10)
  • [39] Optimization of electrical characteristics of gadolinium (Gd2O3) incorporated HfO2GaAs n-type metal-oxide semiconductor capacitors with silicon-interface-passivation layer
    Park, Sung Il
    Ok, Injo
    Kim, Hyoung-Sub
    Zhu, Feng
    Zhang, Manhong
    Yum, Jung Hwan
    Han, Zhao
    Lee, Jack C.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (02): : 624 - 626
  • [40] Reduction of donor-like interface traps of n-type metal-oxide-semiconductor field-effect-transistors using hydrogen-annealed wafer and in-situ HF-vapor treatment
    Chao, TS
    Lin, YH
    Yang, WL
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (1A): : 61 - 63