ATOMIC-FORCE MICROSCOPY IN ULTRAHIGH-VACUUM

被引：66
|
作者：
GIESSIBL, FJ
机构：
[1] Park Scientific Instruments, Sunnyvale, CA, 94089
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 6B期
关键词：
AFM; STM; UHV; SI(111)7X7; NONCONTACT MODE; ATTRACTIVE MODE; CONTACT MODE; REPULSIVE MODE; ATOMIC RESOLUTION; TIP-SAMPLE INTERACTION; FORCE MEASUREMENT;
D O I：
10.1143/JJAP.33.3726
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Since its invention in 1986, atomic force microscopy (AFM) has been used mainly in ambient conditions. Recent advances in instrumentation have fostered the application of AFM in ultrahigh vacuum (UHV). AFM experiments performed in UHV have led to a better understanding of the tip-sample interaction. This article reviews the theory related to achieving true atomic resolution of AFM in UHV in both contact- and noncontact-modes. Preliminary experimental results with unprecedented resolution on KCl and Si(111)7 x 7 achieved by noncontact AFM in UHV are presented.
引用
收藏
页码：3726 / 3734
页数：9
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