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- [22] CHARACTERISTICS OF ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCES JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 894 - 898
- [23] PLASMA RESONATOR IN THE ELECTRON-CYCLOTRON RESONANCE REGIME ZHURNAL TEKHNICHESKOI FIZIKI, 1986, 56 (08): : 1543 - 1551
- [24] SILICIDATION USING ELECTRON-CYCLOTRON RESONANCE PLASMA JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (03): : 1087 - 1090
- [27] MULTICUSP TYPE ELECTRON-CYCLOTRON RESONANCE ION-SOURCE FOR PLASMA PROCESSING JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (02): : 376 - 384
- [28] ION CURRENT-DENSITY AND ITS UNIFORMITY AT THE ELECTRON-CYCLOTRON RESONANCE POSITION IN ELECTRON-CYCLOTRON RESONANCE PLASMA JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (01): : 85 - 90
- [29] OXIDATION OF SILICON IN AN OXYGEN PLASMA GENERATED BY A MULTIPOLAR ELECTRON-CYCLOTRON RESONANCE SOURCE JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (05): : 2211 - 2216
- [30] Tribological modification of aluminum by electron-cyclotron resonance plasma source ion implantation JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1999, 17 (04): : 1996 - 2000