LANGMUIR PROBE MEASUREMENTS DURING PLASMA-ACTIVATED CHEMICAL-VAPOR-DEPOSITION IN THE SYSTEM ARGON/HYDROGEN/DICYCLOPENTADIENYLDIMETHYLHAFIUM

被引：5
|
作者：
SPATENKA, P
PETIG, M
WIESEMANN, K
SUHR, H
机构：
[1] RUHR UNIV BOCHUM,D-44780 BOCHUM,GERMANY
[2] UNIV TUBINGEN,INST ORGAN CHEM,D-72076 TUBINGEN,GERMANY
来源：
PLASMA CHEMISTRY AND PLASMA PROCESSING | 1995年 / 15卷 / 03期
关键词：
LANGMUIR PROBE; PLASMA POTENTIAL; ELECTRON DENSITY; ELECTRON ENERGY; PLASMA CVD; RF-DISCHARGE;
D O I：
10.1007/BF01650735
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
A Langmuir probe investigation of Ar/H-2/Cp(2)HfMe(2) plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydrgen and precursor concentrations. Addition of the precursor into the discharge resulted in an appreciable decrease in the electron density and art increase in the mean electron energy. Whereas a transition from the alpha-mode to the gamma-mode has beert observed with power rise in the Ar/H-2 plasmas without precursor in the presence of the precursor the plasma alpha-mode remained unchanged in the power range investigated.
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页码：371 / 381
页数：11
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