ION-IMPLANTATION FOR GAAS IC FABRICATION

被引:6
|
作者
YAMAZAKI, H
机构
关键词
D O I
10.1016/0168-583X(89)90820-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:433 / 440
页数:8
相关论文
共 50 条
  • [21] ION-IMPLANTATION OF BORON IN GAAS DEVICES
    MCNALLY, PJ
    [J]. COMSAT TECHNICAL REVIEW, 1983, 13 (02): : 437 - 450
  • [22] INFLUENCE OF ION-IMPLANTATION ON THE LUMINESCENCE OF GAAS
    SCIBIOR, H
    BRYLOWSKA, I
    MAZUREK, P
    SUBOTOWICZ, M
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1988, 109 (02): : 597 - 601
  • [23] A 45GHZ ALGAAS/GAAS HBT IC TECHNOLOGY WITHOUT ION-IMPLANTATION
    PRASAD, SJ
    VETANEN, B
    HAYNES, C
    PARK, S
    BEERS, I
    DIAMOND, S
    PUBANZ, G
    EBNER, J
    SANIELEVICI, S
    AGOSTON, A
    [J]. MICROELECTRONIC ENGINEERING, 1992, 19 (1-4) : 413 - 416
  • [24] PROPERTY OF DISORDERED GAAS BY ION-IMPLANTATION
    NOJIMA, S
    KAWASAKI, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (08) : 1455 - 1456
  • [25] FABRICATION OF GAAS/ALGAAS QUANTUM WELL LASERS WITH MEV OXYGEN ION-IMPLANTATION
    XIONG, F
    TOMBRELLO, TA
    WANG, H
    CHEN, TR
    CHEN, HZ
    MORKOC, H
    YARIV, A
    [J]. ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS, 1989, 144 : 367 - 372
  • [26] THE FABRICATION OF GAAS STRUCTURES FOR FETS AND MICROWAVE MONOLITHIC CIRCUITS BY DIRECT ION-IMPLANTATION
    DOERBECK, FH
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 10-1 (MAY): : 506 - 509
  • [27] HIGH-ENERGY ION-IMPLANTATION IN GAAS
    WESCH, W
    WENDLER, E
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 (pt 2): : 716 - 720
  • [28] EFFECTS OF SURFACE PREPARATION ON ION-IMPLANTATION IN GAAS
    DOBRILLA, P
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (06) : 2831 - 2835
  • [29] CHARACTERIZATION AND SIMULATION OF SI ION-IMPLANTATION IN GAAS
    BINDAL, A
    HWU, R
    WANG, KL
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (08) : C327 - C327
  • [30] INVESTIGATION OF DEFECTS INDUCED DURING THE FABRICATION OF INTEGRATED SENSORS ON GAAS USING ION-IMPLANTATION
    MIAO, JM
    HARTNAGEL, HL
    WURFL, J
    RUCK, D
    [J]. DEFECT RECOGNITION AND IMAGE PROCESSING IN SEMICONDUCTORS AND DEVICES, 1994, (135): : 365 - 368