THE INFLUENCE OF DEPOSITION TEMPERATURE ON THE CRYSTALLINE AND ELECTRICAL-PROPERTIES OF THIN SILVER FILMS

被引：23
|
作者：
SCHLEMMINGER, W
STARK, D
机构：
来源：
THIN SOLID FILMS | 1986年 / 137卷 / 01期
关键词：
D O I：
10.1016/0040-6090(86)90193-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：49 / 57
页数：9
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