THE INFLUENCE OF DEPOSITION TEMPERATURE ON THE CRYSTALLINE AND ELECTRICAL-PROPERTIES OF THIN SILVER FILMS

被引：23

|

作者：

SCHLEMMINGER, W

STARK, D

机构：

来源：

THIN SOLID FILMS | 1986年 / 137卷 / 01期

关键词：

D O I：

10.1016/0040-6090(86)90193-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：49 / 57

页数：9

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