EPITAXIAL NUCLEATION OF POLYCRYSTALLINE SILICON-CARBIDE DURING CHEMICAL-VAPOR-DEPOSITION, (VOL 8, PG 1086, 1993)

被引：2
|
作者：
SHELDON, BW
BESMANN, TM
MORE, KL
MOSS, TS
机构：
[1] OAK RIDGE NATL LAB,DIV MET & CERAM,OAK RIDGE,TN 37830
[2] OAK RIDGE ASSOCIATED UNIV,OAK RIDGE,TN 37831
来源：
JOURNAL OF MATERIALS RESEARCH | 1993年 / 8卷 / 09期
关键词：
D O I：
10.1557/JMR.1993.2416
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：2416 / 2418
页数：3
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