AMORPHOUS-SILICON AND AMORPHOUS-SILICON NITRIDE FILMS PREPARED BY A PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION PROCESS AS OPTICAL COATING MATERIALS

被引：18
|
作者：
TSAI, RY
KUO, LC
HO, FC
机构：
[1] Industrial Technology Research Institute, Chutung, 31015
来源：
APPLIED OPTICS | 1993年 / 32卷 / 28期
关键词：
AMORPHOUS SILICON; AMORPHOUS SILICON NITRIDE; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION; FABRY-PEROT INTERFERENCE FILTER; LONG-PASS EDGE FILTER;
D O I：
10.1364/AO.32.005561
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Durable, uniform, and reproducible amorphous silicon and amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition that are appropriate for the design and fabrication of optical interference filters in the near-infrared region are found. Optical and physicalk properties of single-layer films are discussed. The durability and performance of Fabry-Perot interference filters and a 15-layer long-pass edge filter in the near-infrared region designed and fabricated with these two thin-film materials are also reported.
引用
收藏
页码：5561 / 5566
页数：6
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