AC BEHAVIOR OF VACUUM-DEPOSITED PRASEODYMIUM OXIDE-FILMS

被引：41

|

作者：

GOSWAMI, A ^{[1
]}

GOSWAMI, AP ^{[1
]}

机构：

[1] NATL CHEM LAB,POONA,INDIA

来源：

THIN SOLID FILMS | 1974年 / 20卷 / 01期

关键词：

D O I：

10.1016/0040-6090(74)90049-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：S3 / S6

页数：4

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