OXIDATION-INDUCED DEFECT PATTERNS IN CZOCHRALSKI SILICON

被引：0
|
作者：
KUNG, CY
MAXWELL, B
机构：
[1] SUPERTEX INC,SUNNYVALE,CA 94089
[2] PERFORMANCE SEMICOND INC,SUNNYVALE,CA 94089
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 03期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C108 / C108
页数：1
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