MECHANISMS FOR AC-CONDUCTION IN RF-SPUTTERED SIO2-FILMS

被引：7
|
作者：
MEAUDRE, M [1 ]
MEAUDRE, R [1 ]
机构：
[1] UNIV LYON 1,CNRS,DEPT PHYS MAT,F-69622 VILLEURBANNE,FRANCE
来源：
PHYSICAL REVIEW B | 1984年 / 29卷 / 12期
关键词：
D O I：
10.1103/PhysRevB.29.7014
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：7014 / 7019
页数：6
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