THE XEROGEL STRUCTURE OF THERMALLY EVAPORATED TUNGSTEN-OXIDE LAYERS

被引：55

|

作者：

SCHLOTTER, P

PICKELMANN, L

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1982年 / 11卷 / 02期

关键词：

D O I：

10.1007/BF02654669

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

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页码：207 / 236

页数：30

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