WEAK LOCALIZATION IN INDIUM OXIDE-FILMS

被引：26

作者：

OVADYAHU, Z ^{[1
]}

MOEHLECKE, S ^{[1
]}

IMRY, Y ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

SURFACE SCIENCE | 1982年 / 113卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(82)90648-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：544 / 549

页数：6

共 50 条

[31] FIELD-DEPENDENT ELECTRICAL-CONDUCTIVITY OF INDIUM OXIDE-FILMS
JAIN, DK
GARG, JC
INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 1980, 18 (11) : 842 - 844
[32] ELECTROOPTICAL PROPERTIES OF THIN INDIUM TIN OXIDE-FILMS - LIMITATIONS ON PERFORMANCE
DHERE, RG
GESSERT, TA
SCHILLING, LL
NELSON, AJ
JONES, KM
AHARONI, H
COUTTS, TJ
SOLAR CELLS, 1987, 21 : 281 - 290
[33] CONDUCTIVITY MODULATION IN INDIUM OXIDE-FILMS BY OXYGEN-PRESSURE VARIATIONS
LASER, D
JOURNAL OF APPLIED PHYSICS, 1981, 52 (08) : 5179 - 5181
[34] INHOMOGENEOUS INDIUM TIN OXIDE-FILMS PREPARED BY SPUTTERING WITH MULTIPLE TARGETS
SAWADA, Y
TAGA, Y
THIN SOLID FILMS, 1983, 110 (04) : L129 - L132
[35] INDIUM TIN OXIDE-FILMS FROM METALLO-ORGANIC PRECURSORS
XU, JJ
SHAIKH, AS
VEST, RW
THIN SOLID FILMS, 1988, 161 : 273 - 280
[36] ATOM-BEAM SPUTTERED INDIUM-TIN OXIDE-FILMS
ITO, K
NAKAZAWA, T
APPLIED SURFACE SCIENCE, 1988, 33-4 : 913 - 918
[37] CHARACTERISTICS OF INDIUM TIN OXIDE-FILMS DEPOSITED BY RF MAGNETRON SPUTTERING
JOSHI, RN
SINGH, VP
MCCLURE, JC
THIN SOLID FILMS, 1995, 257 (01) : 32 - 35
[38] STUDIES OF H-2+ IMPLANTATION INTO INDIUM TIN OXIDE-FILMS
SERIKAWA, T
SHIRAI, S
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 : 732 - 734
[39] EFFECTS OF HEAT-TREATMENT ON INDIUM-TIN OXIDE-FILMS
SMITH, FTJ
LYU, SL
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (11) : 2388 - 2394
[40] SPUTTERED CADMIUM OXIDE AND INDIUM OXIDE TIN OXIDE-FILMS AS TRANSPARENT ELECTRODES TO CADMIUM SULFIDE
MEHTA, RR
VOGEL, SF
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (06) : 752 - &

← 1 2 3 4 5 →