TECHNOLOGY CAD AT AT-AND-T

被引：2

作者：

LLOYD, P ^{[1
]}

MCANDREW, CC ^{[1
]}

MCLENNAN, MJ ^{[1
]}

NASSIF, SR ^{[1
]}

SINGHAL, K ^{[1
]}

ZEITZOFF, PM ^{[1
]}

DARWISH, MN ^{[1
]}

HARUTA, K ^{[1
]}

LENTZ, JL ^{[1
]}

VUONG, HH ^{[1
]}

PINTO, MR ^{[1
]}

RAFFERTY, CS ^{[1
]}

KIZILYALLI, IC ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

MICROELECTRONICS JOURNAL | 1995年 / 26卷 / 2-3期

关键词：

D O I：

10.1016/0026-2692(95)98915-E

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Technology computer-aided design (TCAD) is essential to the design of modem integrated circuit fabrication processes. TCAD tools must not only model real processes accurately, to allow predictive simulation during technology research and development, but they must work together as an integrated system to allow efficient exploration of technology options. Sensitivity and statistical analyses using an integrated TCAD system provide rapid technology characterization, including the examination of process extremes, before fabrication. This predictive capability reduces the technology design interval, and enables the design of optimized, manufacturable designs. This paper describes the integrated TCAD system in use at AT & T.

引用

页码：79 / 97

页数：19

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