MECHANISMS FOR FLUOROCARBON REACTIVE ION-BEAM ETCHING OF SIO2 BY SIMULTANEOUS AUGER-ELECTRON SPECTROSCOPY MEASUREMENTS

被引：7
|
作者：
THOMSON, DJ
HELMS, CR
机构：
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 11期
关键词：
D O I：
10.1063/1.95776
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1103 / 1104
页数：2
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