MECHANISMS FOR FLUOROCARBON REACTIVE ION-BEAM ETCHING OF SIO2 BY SIMULTANEOUS AUGER-ELECTRON SPECTROSCOPY MEASUREMENTS

被引：7

|

作者：

THOMSON, DJ

HELMS, CR

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 11期

关键词：

D O I：

10.1063/1.95776

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1103 / 1104

页数：2

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