PHENOMENOLOGY OF PICOSECOND HEATING AND EVAPORATION OF SILICON SURFACES COATED WITH SIO2 LAYERS

被引：15
|
作者：
LIU, JM [1 ]
LOMPRE, LA [1 ]
KURZ, H [1 ]
BLOEMBERGEN, N [1 ]
机构：
[1] HARVARD UNIV,DIV APPL SCI,GORDON MCKAY LAB,CAMBRIDGE,MA 02138
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1984年 / 34卷 / 01期
关键词：
D O I：
10.1007/BF00617570
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：25 / 29
页数：5
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